Incorporation of phosphorus into mesostructured silicas: A novel approach to reduce the SiO2 leaching in water

  1. García, A.
  2. Colilla, M.
  3. Izquierdo-Barba, I.
  4. Vallet-Regí, M.
Revue:
Chemistry of Materials

ISSN: 1520-5002,  0897-4756

Année de publication: 2009

Volumen: 21

Número: 18

Pages: 4135-4145

Type: Article

DOI: 10.1021/CM9012816 GOOGLE SCHOLAR

Objectifs de Développement Durable

La source de données: Scopus